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Volumn 20, Issue 6, 2002, Pages 2991-2994

Achieving nanometer-scale, controllable pattern shifts in x-ray lithography using an assembly-tilting technique

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; LIGHT POLARIZATION; MASKS; NANOSTRUCTURED MATERIALS; PHOTORESISTS; SUBSTRATES;

ASSEMBLY TILTING; AZIMUTHAL DIRECTION; DOUBLE EXPOSURE SCHEMES; MASK SUBSTRATE GAP; TILT ANGLE;

X RAY LITHOGRAPHY;

EID: 0036883223 PISSN: 0734211X EISSN: None Source Type: Journal
DOI: 10.1116/1.1523021 Document Type: Article

Times cited : (7)

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