Simultaneous UV direct writing of channel waveguides and Bragg gratings in germanium-doped planar silica

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 8, Issue 6, 2002, Pages 1316-1322

  Marques, Paulo V S ^a,b   Bonar, Jim R ^c   Leite, António M P ^b   Aitchison, J S ^d  

^a UNIVERSITY OF PORTO   (Portugal)

^b UNIVERSITY OF PORTO   (Portugal)

^c Alcatel Optronics UK   (United Kingdom)

^d UNIVERSITY OF TORONTO   (Canada)

Author keywords

Bragg gratings; Direct writing; Flame hydrolysis; Integrated optics; Optical devices; Photosensitivity

Indexed keywords

BOROSILICATE GLASS; DEPOSITION; DIFFRACTION GRATINGS; HYDROLYSIS; INTEGRATED OPTICS; IRRADIATION; LASER APPLICATIONS; LITHOGRAPHY; PHOTOSENSITIVITY; ULTRAVIOLET RADIATION;

BRAGG GRATINGS; CHANNEL WAVEGUIDES; DIRECT WRITING PROCESS; FLAME HYDROLYSIS DEPOSITION; GERMANO-BOROSILICATE GLASS; ULTRAVIOLET LASER IRRADIATION;

OPTICAL WAVEGUIDES;

EID: 0036880865     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2002.806730     Document Type: Article

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