Voltage tunable dielectric properties of rf sputtered Bi2O3-ZnO-Nb2O5 pyrochlore thin films

Thin Solid Films

Volumn 419, Issue 1-2, 2002, Pages 183-188

  Pyo Hong, Young ^a,c   Ha, Seok ^a   Yong Lee, Ha ^a   Cheol Lee, Young ^a   Hyun Ko, Kyung ^a   Kim, Dong Wan ^b   Bum Hong, Hee ^b   Sun Hong, Kug ^b  

^a Ajou University   (South Korea)

^b Seoul National University   (South Korea)

^c NONE   (South Korea)

Author keywords

Dielectric properties; Pyrochlore; Sputtering; Tunability

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; CRYSTALLIZATION; ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; MORPHOLOGY; PERMITTIVITY; SILICON; STRUCTURE (COMPOSITION); SUBSTRATES;

PYROCHLORE THIN FILMS;

THIN FILMS;

EID: 0036848713     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00744-7     Document Type: Article

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