Effect of cerium ion implantation on the oxidation behavior of zircaloy-4 at 500 °C

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 196, Issue 3-4, 2002, Pages 293-298

  Chen, X W ^a   Bai, X D ^a   Yu, H R ^a   Zhou, Q G ^a   Chen, B S ^b  

^a TSINGHUA UNIVERSITY   (China)

^b Jianzhong Chemical Cooperation   (China)

Author keywords

Cerium ion implantation; Oxidation behavior; Phase transformation; Zircaloy 4

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ION IMPLANTATION; OXIDATION; PHASE TRANSITIONS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CERIUM ION IMPLANTATION;

CERIUM;

EID: 0036848645     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01356-3     Document Type: Article

References (9)

1. McCafferty E., Natishan P.M., Hubler G.K. Nucl. Instr. and Meth. B. 56-57:1991;639.
2. Etoh Y., Shimada S., Kikuchi K. J. Nucl. Sci. Tech. 29(12):1992;1173.
3. Xu J., Bai X., Jin A., Fan Y. J. Mater. Sci. Lett. 19:2000;1633.
4. Bai X., Xu J., He F., Fan Y. Nucl. Instr. and Meth. B. 160:2000;49.
5. He F., Bai X., Xu J., Wang S., An J., Sun Z., Fan Yudian J. Mater. Sci. Lett. 18:1999;715.
6. Stringer J. Mater. Sci. Eng. A. 120:1989;129.
7. Saito Y., Onay B., Maruyanma T. J. Phys. IV. 3:1993;217.
8. Stroosnijder M.F., Mevrel R., Bennett M.J. Mater. High Temp. 12:1994;53.
9. Przybylski K., Yurek G.J. Mater. Sci. Forum. 43:1989;1.