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Volumn 161, Issue 1, 2002, Pages 11-19

X-ray photoelectron spectroscopy study of phosphorus silicate glasses

Author keywords

Etching rates; Phosphorus silicate glass; Rapid thermal annealing; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; ETCHING; PHASE TRANSITIONS; SAMPLING; THERMAL EFFECTS; VACUUM;

EID: 0036837558     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00383-3     Document Type: Article
Times cited : (4)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.