Nb-doped CaTiO3 transparent semiconductor thin films

Journal of Crystal Growth

Volumn 245, Issue 1-2, 2002, Pages 63-66

  Wang, R P ^a   Tao, C J ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

A1. Characterization; A3. Laser epitaxy; B1. Oxides; B2. Semiconducting materials

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALCIUM COMPOUNDS; CARRIER CONCENTRATION; COLOSSAL MAGNETORESISTANCE; EPITAXIAL GROWTH; HIGH TEMPERATURE SUPERCONDUCTORS; NIOBIUM; PULSED LASER DEPOSITION; SEMICONDUCTING FILMS; SEMICONDUCTOR DOPING; SURFACE ROUGHNESS;

LASER EPITAXY;

THIN FILMS;

EID: 0036836731     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)01646-9     Document Type: Article

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