Microprocessing by intense pulsed electron beam

IEEE Transactions on Plasma Science

Volumn 30, Issue 5 I, 2002, Pages 1837-1842

  Goktas, H ^a   Kirkici, Hulya ^b   Oke, G ^c   Udrea, M V ^d  

^a Ankara Nuclear Research and Training Center   (Turkey)

^b AUBURN UNIVERSITY   (United States)

^c MIDDLE EAST TECHNICAL UNIVERSITY   (Turkey)

^d NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Electron beam; Material processing

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLOW DISCHARGES; IONIZATION; LASER APPLICATIONS; MAGNETIC FIELD EFFECTS; MICROMACHINING; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

INTENSE PULSED ELECTRON BEAM; PULSED DISCHARGE; X RAY GENERATION;

ELECTRON BEAMS;

EID: 0036826726     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.806620     Document Type: Article

References (13)

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