Effect of top electrode deposition condition on polarization fatigue of RuO2/Pb(Zr,Ti) O3/RuO2 thin film capacitors

Journal of the Electrochemical Society

Volumn 149, Issue 10, 2002, Pages

  Hong, Suk Kyoung ^a   Kim, Hyeong Joon ^a   Yang, Hong Geun ^b  

^a Seoul National University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; ELECTRODES; FATIGUE OF MATERIALS; INTERFACES (MATERIALS); ION BOMBARDMENT; POLARIZATION; SPUTTER DEPOSITION; THIN FILMS;

SPUTTERING DAMAGES;

CAPACITORS;

EID: 0036805317     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1506304     Document Type: Article

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