Advanced diffusion system for low contamination in-line rapid thermal processing of silicon solar cells

Solar Energy Materials and Solar Cells

Volumn 74, Issue 1-4, 2002, Pages 35-41

  Biro, D ^a   Preu, R ^a   Schultz, O ^a   Peters, S ^a   Huljic, D M ^a   Zickermann, D ^a   Schindler, R ^a   Ludemann R ^a   Willeke, G ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

Manufacturing and processing; Rapid thermal processing; Screen printing; Silicon solar cells

Indexed keywords

ANTIREFLECTION COATINGS; CONTAMINATION; ELECTRIC RESISTANCE; HEATING FURNACES; SCREEN PRINTING; SEMICONDUCTOR DOPING; SILICON NITRIDE; THERMAL DIFFUSION;

RAPID THERMAL PROCESSING (RTP);

SILICON SOLAR CELLS;

EID: 0036777766     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00045-4     Document Type: Article

References (10)

1. Characterization and application of rapid thermal oxide surface passivation for the highest efficiency RTP silicon solar cells
2. RTP-Processed 17.5% Efficient silicon solar cells featuring a record small thermal budget
3. Integration of screen-printing and rapid thermal processing technologies for silicon solar cell fabrication
4. Screen printed and RT-processed emitters for crystalline silicon solar cells
5. Screen-printed rapid thermal processed (RTP) selective emitter solar cells using a single diffusion step
6. Screen-printed paste, spin-on source applied to selective emitter formation in a single rapid thermal diffusion step
7. High throughput processing of large area multicrystalline silicon solar cells by rapid thermal processing and screen printing
8. Rapid thermal firing of screen printed contacts for large area crystalline silicon solar cells
9. Novel method to form selective emitters in one diffusion step without etching or masking