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Volumn 64, Issue 1-4, 2002, Pages 125-130
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TiAl3 formation kinetic in sputtered Ti/AlCu0.5% thin films
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Author keywords
In situ anneal; Kinetic; TiAl3
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Indexed keywords
ACTIVATION ENERGY;
ANNEALING;
ELECTRIC CONNECTORS;
ELECTRIC RESISTANCE;
GRAIN SIZE AND SHAPE;
INTERMETALLICS;
MORPHOLOGY;
REACTION KINETICS;
SPUTTERING;
TITANIUM ALLOYS;
TRANSMISSION ELECTRON MICROSCOPY;
INTERCONNECTIONS;
THIN FILMS;
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EID: 0036776399
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(02)00776-1 Document Type: Conference Paper |
Times cited : (18)
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References (4)
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