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Volumn 64, Issue 1-4, 2002, Pages 125-130

TiAl3 formation kinetic in sputtered Ti/AlCu0.5% thin films

Author keywords

In situ anneal; Kinetic; TiAl3

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ELECTRIC CONNECTORS; ELECTRIC RESISTANCE; GRAIN SIZE AND SHAPE; INTERMETALLICS; MORPHOLOGY; REACTION KINETICS; SPUTTERING; TITANIUM ALLOYS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0036776399     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00776-1     Document Type: Conference Paper
Times cited : (18)

References (4)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.