Quantum lithography

Optics and Photonics News

Volumn 13, Issue 9, 2002, Pages

  Kok, Pieter ^a   Braunstein, Samuel L ^b   Dowling, Jonathan P ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; LIGHT INTERFERENCE; PHOTONS; QUANTUM OPTICS;

MINIATURIZATION;

PHOTOLITHOGRAPHY;

EID: 0036766765     PISSN: 10476938     EISSN: None     Source Type: Trade Journal    
DOI: 10.1364/OPN.13.9.000024     Document Type: Article

References (9)

1. E.Yablonovich and R.B.Vrijen, Opt. Eng. 38, 334-338 (1999).
2. A.N. Boto, P. Kok, D.S.Abrams, S.L. Braunstein, C.P. Williams, and J.R Dowling, Phys. Rev. Lett. 85, 2733 (2000); P. Kok,A.N. Boto, D.S.Abrams, C.P.Williams, S.L. Braunstein, and J.P. Dowling, Phys, Rev. A 63, 063407 (2001).
3. A.N. Boto, P. Kok, D.S.Abrams, S.L. Braunstein, C.P. Williams, and J.R Dowling, Phys. Rev. Lett. 85, 2733 (2000); P. Kok,A.N. Boto, D.S.Abrams, C.P.Williams, S.L. Braunstein, and J.P. Dowling, Phys, Rev. A 63, 063407 (2001).
4. G. Björk, L.L. Sanchez-Soto, and J. Soderholm, Phys. Rev. Lett. 86, 4516 (2001).
5. This is the main reason why manufacturers do not use near-field lithography; the evanescent waves of the electromagnetic field are not bounded by the Rayleigh limit, but the time it takes to scan an area the size of a microchip is unpractical [5]).
6. V. Sandoghdar, Physics World, September 2001, pp. 29-33.
7. C.K. Hong, Z.Y. Ou, and L. Mandel, Phys. Rev. Lett. 59, 2044 (1987).
8. H. Lee, P. Kok, N.J. Cerf, and J.P. Dowling, Phys. Rev. A 65, 030101 (2002); P. Kok, H. Lee, and J.P. Dowling, Phys. Rev. A 65, 052104 (2002).
9. H. Lee, P. Kok, N.J. Cerf, and J.P. Dowling, Phys. Rev. A 65, 030101 (2002); P. Kok, H. Lee, and J.P. Dowling, Phys. Rev. A 65, 052104 (2002).