Analysis of semiconductor-grade HCl with the ELAN DRC ICP-MS: Elimination of chloride-based interferences

Atomic Spectroscopy

Volumn 23, Issue 5, 2002, Pages 165-169

  Kishi, Yoko ^a   Kawabata, Katsu ^a   Neubauer, Kenneth ^b  

^a Perkin Elmer Sciex Instruments   (Canada)

^b PERKINELMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ARSENIC; CHLORIDE; CHROMIUM; HYDROCHLORIC ACID; OXIDE; SELENIUM; VANADIUM;

ARTICLE; CALCULATION; CALIBRATION; CHEMICAL REACTION; CONTAMINATION; MASS SPECTROMETRY; QUANTITATIVE ANALYSIS; SEMICONDUCTOR; SPIKE;

EID: 0036760938     PISSN: 01955373     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (4)

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2. D. Bandura, S. Tanner, V. Baranov, G. Koyanagi, and V. Lavov, R. Soc. Chem.-Spec. Pub. 267, 130 (2001).
3. J. Olesik, C. Hensman, and S. Rabb, R. Soc. Chem. - Spec. Pub. 267, 3 (2001).
4. S. Tanner, V. Baranov, and U. Voellkopf, J. Anal. At. Spectrom. 15, 1261 (2000).