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Volumn 46, Issue 5, 2002, Pages 415-421

Design of a MEMS ejector for printing applications

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; ELECTRIC BREAKDOWN OF LIQUIDS; ELECTRIC CONDUCTIVITY OF LIQUIDS; ELECTROSTATICS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; NOZZLES; POLYSILICON; SILICA;

EID: 0036755054     PISSN: 10623701     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (19)

References (10)
  • 1
    • 0011232587 scopus 로고    scopus 로고
    • http://www.mdl.sandia.gov/Micromachine.
  • 3
    • 0022061364 scopus 로고
    • Thermodynamics and hydrodynamics of thermal ink jets
    • R. R. Allen, J. D. Meyer, and W. R. Knight, Thermodynamics and Hydrodynamics of Thermal Ink Jets, Hewlett Packard Journal, 36, 21-27 (1985).
    • (1985) Hewlett Packard Journal , vol.36 , pp. 21-27
    • Allen, R.R.1    Meyer, J.D.2    Knight, W.R.3
  • 5
    • 0011241598 scopus 로고
    • Pulsed dielectric breakdown of pressurized water and salt solutions
    • H. M. Jones and E. E. Kunhardt, Pulsed Dielectric Breakdown of Pressurized Water and Salt Solutions, J. Appl. Phys. 77(2), 795805 (1995).
    • (1995) J. Appl. Phys. , vol.77 , Issue.2 , pp. 795805
    • Jones, H.M.1    Kunhardt, E.E.2
  • 6
    • 0011181892 scopus 로고
    • Electrical breakdown of a small gap filled with distilled water
    • B. A. Srebrov, L. P. Dishkova and F. I. Kuzmanova, Electrical Breakdown of a Small Gap Filled with Distilled Water, Sov. Tech. Phys. Letters. 16(1), 7071 (1990).
    • (1990) Sov. Tech. Phys. Letters , vol.16 , Issue.1 , pp. 7071
    • Srebrov, B.A.1    Dishkova, L.P.2    Kuzmanova, F.I.3
  • 7
    • 0024620911 scopus 로고
    • Theoretical model of the anodic oxidation growth kinetics of si at constant voltage
    • K. Ghowsi and R. J. Gale, Theoretical Model of the Anodic Oxidation Growth Kinetics of Si at Constant Voltage, J. Electrochem. Soc. 136(3), 867871 (1989).
    • (1989) J. Electrochem. Soc. , vol.136 , Issue.3 , pp. 867871
    • Ghowsi, K.1    Gale, R.J.2
  • 9
    • 0011252223 scopus 로고    scopus 로고
    • GmbH, method on anisotropically etching silicon
    • Robert Bosch, GmbH, Method on Anisotropically Etching Silicon, U.S. Patent No. 5,501,893 (1996).
    • (1996) U.S. Patent No. 5,501,893
    • Bosch, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.