W and WC layers deposition by shielded inductively coupled plasma source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1632-1638

  Colpo, P ^a   Meziani, T ^a   Sauvageot, P ^a   Ceccone, G ^a   Gibson, P N ^a   Rossi, F ^a   Monge Cadet, P ^b  

^a JOINT RESEARCH CENTRE   (Italy)

^b TURBOMECA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRIC VARIABLES MEASUREMENT; INDUCTIVELY COUPLED PLASMA; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RADIATION SHIELDING; TUNGSTEN; X RAY DIFFRACTION ANALYSIS;

ELECTROMAGNETIC COUPLING;

CONDUCTIVE FILMS;

EID: 0036751065     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1495509     Document Type: Article

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