Qualitative X-ray diffraction analysis of residual stresses in NdNiO3 thin films with metal-insulator transition

Journal of Materials Science Letters

Volumn 21, Issue 17, 2002, Pages 1379-1383

  Zaghrioui, M ^a,b   Laffez, P ^a   Goudeau, P ^c   Thiaudiere D ^d  

^a UNIVERSITÉ DU MAINE   (France)

^b UNIVERSITÉ DE TOURS   (France)

^c UNIVERSITÉ DE POITIERS   (France)

^d UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELASTICITY; METAL INSULATOR TRANSITION; MORPHOLOGY; RESIDUAL STRESSES; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

STRESS-PROPERTY RELATION; X RAY REFLECTIVITY;

NEODYMIUM COMPOUNDS;

EID: 0036750757     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1019781019560     Document Type: Article

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