Optimization of two-monomer-based photopolymer used for holographic recording

Materials Letters

Volumn 56, Issue 1-2, 2002, Pages 3-8

  Yao, Huawen ^a   Huang, Mingju ^a   Chen, Zhongyu ^a   Hou, Lisong ^a   Gan, Fuxi ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

Diffraction efficiency; Hologram; Optimization; Photopolymer; Sensitivity

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; HOLOGRAMS; HOLOGRAPHIC INTERFEROMETRY; MONOMERS; OPTICAL DATA STORAGE; OPTICAL RECORDING; PHOTOSENSITIVITY;

PHOTOPOLYMERS;

PHOTOPOLYMERIZATION;

EID: 0036742960     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(02)00406-8     Document Type: Article

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