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Volumn 76, Issue 3, 2002, Pages 262-266

Fabrication and characterization of InP nanocrystals embedded in SiO2 matrix by RF magnetron co-sputtering

(9) Ding, Ruiqin a,b Wang, Hao a Yang, Huidong a She, Weilong b Qiu, Zhiren b Luo, Li b Lau, W F c Cheung, W Y c Wong, S P c

a Wuyi University (China)

b SUN YAT SEN UNIVERSITY (China)

c CHINESE UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

InP nanocrystals; Magnetron co sputtering; Optical properties; Stoichiometry

Indexed keywords

ANNEALING; CHARACTERIZATION; COMPOSITE MATERIALS; FUSED SILICA; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; QUANTUM THEORY; RAMAN SCATTERING; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

COMPOSITE FILMS;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0036722095 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/S0254-0584(01)00537-5 Document Type: Article

Times cited : (9)

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