Quantitative analysis of physical and chemical changes in CMP polyurethane pad surfaces

Materials Characterization

Volumn 49, Issue 1, 2002, Pages 35-44

  Lu, H ^a   Fookes, B ^a   Obeng, Y ^b   Machinski, S ^a   Richardson, K A ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b psiloQuest Inc   (United States)

Author keywords

ATR FTIR; CMP PADS; Polyurethane; Surface topography; White light interferometry

Indexed keywords

BAND STRUCTURE; CHEMICAL MECHANICAL POLISHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTERFEROMETERS; POLISHING; SCANNING ELECTRON MICROSCOPY; SURFACE TOPOGRAPHY;

WHITE LIGHT INTERFEROMETRY (WLI);

POLYURETHANES;

EID: 0036703871     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1044-5803(02)00285-1     Document Type: Article

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