Surfactant effect of oxygen atoms on epitaxial growth of fcc ultra thin films on Cu(001)

Materials Transactions

Volumn 43, Issue 8, 2002, Pages 2143-2147

  Onishi, Masaki ^a   Li, Lin ^a   Torii, Shingo ^a   Kida, Ayumu ^a   Doi, Masaaki ^a   Matsui, Masaaki ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

(GMR); Epitaxial growth; Magnetic properties; Molecular beam epitaxy; Multilayer; Oxygen surfactant; Reflection high energy electron diffraction; Ultra thin films

Indexed keywords

COPPER; GIANT MAGNETORESISTANCE; MAGNETIC PROPERTIES; MAGNETOMETERS; MOLECULAR BEAM EPITAXY; MULTILAYERS; OXYGEN; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; SURFACE ACTIVE AGENTS; SURFACE STRUCTURE;

VIBRATING SAMPLE MAGNETOMETERS (VSM);

ULTRATHIN FILMS;

EID: 0036698876     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.43.2143     Document Type: Article

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