Self-narrowing and photoetching effects on the size distribution of CdS quantum dots prepared by a reverse-micelle method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 8, 2002, Pages 5064-5068

  Kim, DaeGwi ^a   Teratani, Naomi ^a   Nakayama, Masaaki ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

CdS; Photoetching; Quantum dot; Reverse micelle method; Self narrowing

Indexed keywords

CADMIUM SULFIDE; ETCHING; MICELLES; TRANSMISSION ELECTRON MICROSCOPY;

PHOTOETCHING; REVERSE-MICELLE METHOD;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0036697962     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.5064     Document Type: Article

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