Large-area excimer laser lithography and photoablation systems

Microlithography World

Volumn 11, Issue 3, 2002, Pages 8-10

  Jain, K ^a   Zemel, M ^a   Klosner, M ^a  

^a Anvik Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; EXCIMER LASERS; INTEGRATED CIRCUIT MANUFACTURE; LASER ABLATION; PROJECTION SYSTEMS;

PHOTOABLATION SYSTEMS;

PHOTORESISTS;

EID: 0036686321     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (5)