Direct numerical inversion method for kinetic ellipsometric data. II. Implementation and experimental verification

Applied Optics

Volumn 41, Issue 22, 2002, Pages 4519-4525

  Hofrichter, Alfred ^a,b   Kouznetsov, Dmitri ^a   Bulkin, Pavel ^a   Drévillon, Bernard ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b Saint Gobain Glass Deutschland GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; ELLIPSOMETRY; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCARBONATES; REFRACTIVE INDEX; SILICON COMPOUNDS; SUBSTRATES; THIN FILMS;

ABSORBING MATERIALS;

OPTICAL FILMS;

EID: 0036685453     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.004519     Document Type: Article

References (5)

1. D. Kouznetsov, A. Hofrichter, and B. Drévillon, “Direct numerical inversion method for kinetic ellipsometric data. I. Presentation of the method and numerical evaluation,” Appl. Opt. 41, 4510-4518 (2002).
2. 2in integrated distributed electron cyclotron resonance microwave reactor,” Thin Solid Films 296, 66-68 (1997).
3. B. Drévillon, “Phase modulated ellipsometry from the ultraviolet to the infrared: in situ applications to the growth of semi conductors,” Prog. Cryst. Growth Charact. Mater. 27, 1-87 (1993).
4. T. Heitz, A. Hofrichter, P. Bulkin, and B. Drévillon, “Real time control of plasma deposited optical filters by multiwavelength ellipsometry,” J. Vac. Sci. Technol. A 18, 1303-1307 (2000).
5. W. H. Southwell and R. L. Hall, “Rugate filter sidelobe suppression using quintic and rugated quintic matching layers,” Appl. Opt. 28, 2949-2951 (1989).