The influences of oxygen impurity contained in nitrogen gas on the annealing of titanium nitride

Journal of the European Ceramic Society

Volumn 22, Issue 8, 2002, Pages 1367-1374

  Lu, Fu Hsing ^a   Lo, Jen Li ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Annealing; Dissolution; Oxidation; Oxide scale; TiN

Indexed keywords

ANNEALING; FURNACES; IN SITU PROCESSING; MORPHOLOGY; OXYGEN; PARTIAL PRESSURE; TITANIUM NITRIDE; X RAY DIFFRACTION;

RELATIVE INTEGRATED INTENSITY;

CERAMIC MATERIALS;

ANNEALING; DISSOLUTION; NITROGEN; OXIDATION; OXYGEN; POLLUTANT; TITANIUM NITRIDE;

EID: 0036680739     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(01)00444-7     Document Type: Article

References (15)

1. High-temperature oxidation of ion-plated TiN and TiAlN films
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4. Thermal oxidation of reactively sputtered titanium nitride and hafnium nitride films
5. 2
6. Über die oxidation der titannitrids II Der mechanismus der oxidation
7. 4-TiN composites
8. Oxidation of mechanism of titanium nitride in oxygen
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10. The degradation of TiN films on Cu substrates at high temperature under controlled atmosphere
11. Uber die loslichkeit von wasserstoff und sauerstoff in festem und geschmolzenem silber