Self-aligned fabrication of thin-film transistors with field-induced drain

Solid-State Electronics

Volumn 46, Issue 8, 2002, Pages 1091-1095

  Yu, C M ^a   Lin, H C ^b   Lin, C Y ^b   Yeh, K L ^a   Huang, T Y ^a,b   Lei, T F ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

Field induced drain; Leakage; Thin film transistor

Indexed keywords

ELECTRIC FIELDS; FABRICATION; LEAKAGE CURRENTS; LIQUID CRYSTAL DISPLAYS; POLYCRYSTALLINE MATERIALS; SILICON;

ACTIVE MATRIX LIQUID-CRYSTAL DISPLAY (AMLCD); FIELD-INDUCED DRAIN (FID);

THIN FILM TRANSISTORS;

EID: 0036680427     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(02)00047-3     Document Type: Article

References (10)