Modelling of a microwave flowing oxygen discharge: Application to remote plasma enhanced CVD of silica films

Plasma Sources Science and Technology

Volumn 11, Issue 3, 2002, Pages 241-247

  Tristant, P ^a   Gousset, G ^b   Regnier C ^a   Desmaison, J ^a  

^a UNIVERSITY OF LIMOGES   (France)

^b UNIVERSITÉ PARIS SUD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COATINGS; COMPOSITION EFFECTS; FILMS; KINETIC THEORY; MATHEMATICAL MODELS; MICROWAVES; OXYGEN; PRESSURE EFFECTS; SILICA;

KINETIC MODEL; MICROWAVE FLOWING OXYGEN DISCHARGE; QUARTZ TUBE; SILICA FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0036672160     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/11/3/303     Document Type: Article

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