|
|
Volumn 11, Issue 3 A, 2002, Pages
|
|
Controlling surfaces in plasma processing: Role of ions via molecular dynamics simulations of surface chemistry
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ADSORPTION;
AMORPHOUS SILICON;
ARGON;
ATOMS;
COMPUTER SIMULATION;
CRACKS;
FLUORINE;
ION BOMBARDMENT;
MOLECULAR DYNAMICS;
POSITIVE IONS;
SURFACE CHEMISTRY;
SURFACE PROPERTIES;
CREVICES;
CRYSTALLINE LAYER;
ENERGETIC IONS;
MOLECULAR DYNAMICS SIMULATIONS;
PLASMA PROCESSING;
SURFACE AREA;
PLASMA APPLICATIONS;
|
|
EID: 0036671703
PISSN: 09630252
EISSN: None
Source Type: Journal
DOI: 10.1088/0963-0252/11/3A/328 Document Type: Conference Paper |
|
Times cited : (13)
|
|
References (14)
|
