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Volumn 415, Issue 1-2, 2002, Pages 138-142

Surface chemical states and oxidation resistivity of 'ecologically friendly' semiconductor (β-FeSi2) thin films

(7) Saito, Takeru a Yamamoto, Hiroyuki a Sasase, Masato b Nakanoya, Takamitsu a Yamaguchi, Kenji a Haraguchi, Masaharu a Hojou, Kiichi a

a JAPAN ATOMIC ENERGY AGENCY (Japan)

b WAKASA WAN ENERGY RESEARCH CENTER (Japan)

Author keywords

Ecologically friendly materials; Electron microscopoy; Iron disilicide; Oxidation resistivity; Semiconducting surfaces; Synchrotron radiation; X ray photoelectron spectroscopy

Indexed keywords

ION BEAM ASSISTED DEPOSITION; IRON COMPOUNDS; MORPHOLOGY; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SPUTTER DEPOSITION; SURFACES; SYNCHROTRON RADIATION; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ECOLOGICALLY FRIENDLY MATERIALS;

THIN FILMS;

EID: 0036670020 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00555-2 Document Type: Article

Times cited : (26)

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