Intrinsic efficiency of LR-115 in alpha particles detection: Simulations and experiments

Radiation Measurements

Volumn 35, Issue 4, 2002, Pages 307-313

  Aharmim, B ^a   Sabir, A ^a   Marah, H ^b  

^a IBN TOFAIL UNIVERSITY   (Morocco)

^b CENTRE NATIONAL DE L ENERGIE DES SCIENCES TECHNIQUES NUCLEAIRES   (Morocco)

Author keywords

Chemical etching; Intrinsic efficiency of detection; LR115; Variable track etch rate

Indexed keywords

ALPHA PARTICLES; COMPUTER SIMULATION; DEFECTS; IONIZATION; NITRATES;

CHEMICAL ETCHING;

PARTICLE DETECTORS;

EID: 0036667226     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1350-4487(02)00063-X     Document Type: Article

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