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Volumn 20, Issue 4, 2002, Pages 1369-1373
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Study of the properties of thin films of silicon nitride and silicon oxide using effective medium theories
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COMPUTER SIMULATION;
DENSITY (OPTICAL);
MAXWELL EQUATIONS;
NUMERICAL ANALYSIS;
PERCOLATION (SOLID STATE);
PHASE TRANSITIONS;
SILICA;
SILICON NITRIDE;
EFFECTIVE MEDIUM THEORIES;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION;
OPTICAL CONSTANTS;
THIN FILMS;
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EID: 0036649685
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1486005 Document Type: Article |
Times cited : (4)
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References (17)
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