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Volumn 20, Issue 4, 2002, Pages 1369-1373

Study of the properties of thin films of silicon nitride and silicon oxide using effective medium theories

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DENSITY (OPTICAL); MAXWELL EQUATIONS; NUMERICAL ANALYSIS; PERCOLATION (SOLID STATE); PHASE TRANSITIONS; SILICA; SILICON NITRIDE;

EID: 0036649685     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1486005     Document Type: Article
Times cited : (4)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.