Concept, construction and commissioning of an alignment system for deep X-ray lithography

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 1107-1112

  Wilhelmi, Oliver ^a   Peredkov, S S ^a   Bogdanov, A L ^a  

^a LUND UNIVERSITY   (Sweden)

Author keywords

Alignment; Deep X ray lithography; LIGA

Indexed keywords

IRRADIATION; MASKS; PHOTOCURRENTS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

DEEP X-RAY LITHOGRAPHY;

MICROELECTRONICS;

EID: 0036643785     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00584-1     Document Type: Conference Paper

References (5)