Microstructure of Al-alloy surface implanted with high-dose nitrogen

Surface and Coatings Technology

Volumn 156, Issue 1-3, 2002, Pages 166-169

  Hara, Yoshihito ^a   Yamanishi, Tetsuji ^a   Azuma, Kingo ^a   Uchida, Hitoshi ^a   Yatsuzuka, Mitsuyasu ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

AFM analysis; AlN; Casting aluminum alloy; Plasma based ion implantation (PBII); Roughness; Sputtering

Indexed keywords

ALUMINUM ALLOYS; ION IMPLANTATION; NITROGEN; PLASMA APPLICATIONS; SURFACE ROUGHNESS;

NEGATIVE BIAS VOLTAGE;

MICROSTRUCTURE;

ALUMINUM ALLOY; CORROSION RESISTANCE; ION IMPLANTATION; MICROSTRUCTURE; ROUGHNESS; SPUTTERING;

EID: 0036641136     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00123-8     Document Type: Article

References (5)