An initial analysis of mechanisms leading to late stage abnormal grain growth in nanocrystalline Ni

Scripta Materialia

Volumn 47, Issue 2, 2002, Pages 83-87

  Hibbard, G D ^a   McCrea, J L ^b   Palumbo, G ^b   Aust, K T ^a   Erb, U ^a  

^a UNIVERSITY OF TORONTO   (Canada)

^b Integran Technologies Inc   (Canada)

Author keywords

Grain growth; Nanostructured materials; Nickel; Segregation

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; ELECTRODEPOSITION; GRAIN GROWTH; GRAIN SIZE AND SHAPE; IMAGE ANALYSIS; INTERFACES (MATERIALS); NICKEL ALLOYS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SEGREGATION (METALLOGRAPHY); TRANSMISSION ELECTRON MICROSCOPY;

ABNORMAL GROWTH INTERFACES; GRAIN EMBEDDING;

NANOSTRUCTURED MATERIALS;

EID: 0036639134     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(02)00098-2     Document Type: Article

References (17)