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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4033-4036

157 nm lithography for 70 nm technology node

(1) Itani, Toshiro a

a SLET Inc (Japan)

Author keywords

157 nm lithography; Chemically amplified resist; F2 laser; Mask material; Resolution enhancement technique

Indexed keywords

GAS LASERS; MASKS; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE;

RESIST PROCESSING;

PHOTORESISTS;

EID: 0036614692 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.41.4033 Document Type: Article

Times cited : (6)

References (10)

1
- 0004245602
- Roadmap update, by the Semiconductor Industry Association & International SEMATECH
- (2000) International Technology Roadmap for Semiconductors

2
- 4143150811
- (1997) J. Vac. Sci. Technol. , vol.B15 , pp. 2112
- Bloomstein, T.M.¹ Horn, M.W.² Rothschild, M.³ Kunz, R.R.⁴ Palmacci, S.T.⁵ Goodman, R.B.⁶

3
- 0034583945
- (2000) J. Photopolym. Sci. Technol. , vol.13 , pp. 369
- Rothschild, M.¹ Bloomstein, T.M.² Fedynyshyn, T.H.³ Kunz, R.R.⁴ Liberman, V.⁵ Switkes, M.⁶

4
- 0034755512
- (2001) Proc. SPIE , vol.4345 , pp. 371
- Toriumi, M.¹ Ishikawa, S.² Miyoshi, S.³ Naito, T.⁴ Yamazaki, T.⁵ Watanabe, M.⁶ Itani, T.⁷

5
- 0034769051
- (2001) Proc. SPIE , vol.4345 , pp. 361
- Satou, I.¹ Watanabe, M.² Watanabe, H.³ Itani, T.⁴

6
- 0000224491
- (2000) Proc. SPIE , vol.4186 , pp. 268
- Matsuo, T.¹ Onodera, T.² Itani, T.³ Morimoto, H.⁴ Haraguchi, T.⁵ Kanayama, K.⁶ Matsuo, T.⁷ Otaki, M.⁸

7
- 0035759030
- (2001) Proc. SPIE , vol.4346 , pp. 61
- Onodera, T.¹ Matsuo, T.² Itani, T.³ Morimoto, H.⁴

8
- 0035758313
- (2001) Proc. SPIE , vol.4346 , pp. 81
- Shiraishi, N.¹ Owa, S.² Omura, Y.³ Aoki, T.⁴ Matsumoto, Y.⁵ Hatasawa, M.⁶ Mori, T.⁷ Tanaka, I.⁸

9
- 0010146791
- Presentation No. 301 at
- (2001) 2nd 157 nm Symp.
- Burnett, J.H.¹ Levine, Z.H.² Shirley, E.L.³

10
- 0032675485
- (1999) Proc. SPIE , vol.3678 , pp. 13
- Kunz, R.R.¹ Bloomstein, T.M.² Hardy, D.E.³ Goodman, R.B.⁴ Downs, D.K.⁵ Curtin, J.E.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.