Influence of Si addition and relaxation on the crystallization of Zr-Al-Ni-Cu based amorphous alloys

Journal of Materials Science Letters

Volumn 21, Issue 11, 2002, Pages 893-896

  Qi, Min ^a   Wang, X D ^a   Deledda, S ^b   Eckert, J ^b   Schultz, L ^b  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b Institute for Metallic Materials   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ADDITION REACTIONS; AMORPHOUS ALLOYS; COMPOSITION EFFECTS; CRYSTALLIZATION; DIFFERENTIAL THERMAL ANALYSIS; GLASS TRANSITION; RELAXATION PROCESSES; SILICON; TEMPERATURE; X RAY DIFFRACTION ANALYSIS;

ARRHENIUS EQUATION; KISSINGER METHOD; PRE-RELAXATION TREATMENT; ZIRCONIUM ALUMINUM NICKEL COPPER SILICON ALLOYS;

ZIRCONIUM ALLOYS;

EID: 0036612503     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1015787031715     Document Type: Article

References (17)