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Journal of the Electrochemical Society

Volumn 149, Issue 6, 2002, Pages

Preparation and characterization of Cu-doped p-CdTe films grown by cathodic electrodeposition

(6) Takahashi, Makoto a Muramatsu, Yasuhiko a Watanabe, Makoto a Wakita, Koichi a Miyuki, Takuhiro b Ikeda, Shoichiro b

a CHUBU UNIVERSITY (Japan)

b NAGOYA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; COPPER; ELECTRODEPOSITION; FILM GROWTH; HALL EFFECT; REFLECTOMETERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CATHODIC ELECTRODEPOSITION; CRYSTALLINITY; HOLE CONCENTRATION; VAN DER PAUW METHOD;

SEMICONDUCTING CADMIUM TELLURIDE;

EID: 0036607317 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1470660 Document Type: Article

Times cited : (8)

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