Investigation on kinetics of thermal decomposition in polysiloxane networks used as precursors of silicon oxycarbide glasses

Journal of Non-Crystalline Solids

Volumn 304, Issue 1-3, 2002, Pages 92-100

  Schiavon, M A ^a   Redondo, S U A ^a   Pina, S R O ^a   Yoshida, I V P ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; GLASS; INFRARED SPECTROSCOPY; MOLECULAR STRUCTURE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PYROLYSIS; REACTION KINETICS; SILICON; X RAY DIFFRACTION ANALYSIS;

SILICON OXYCARBIDE GLASSES;

SILICONES;

EID: 0036605224     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(02)01009-8     Document Type: Conference Paper

References (24)