SCOPUS 정보 검색 플랫폼

Volumn 45, Issue 6, 2002, Pages 83-94

Shallow and abrupt junction formation: Paradigm shift at 65-70 nm

(3) Borland, John Ogawa a Matsuda, Tomoko a Sakamoto, Keiji a

a Varian Semiconductor Equip Assoc (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTALLIZATION; DIELECTRIC MATERIALS; PERMITTIVITY; RAPID THERMAL ANNEALING; SEMICONDUCTOR DOPING; SEMICONDUCTOR JUNCTIONS; SILICON ON INSULATOR TECHNOLOGY; THERMODYNAMIC STABILITY;

SOLID PHASE EPITAXY (SPE);

EPITAXIAL GROWTH;

EID: 0036602984 PISSN: 0038111X EISSN: None Source Type: Trade Journal
DOI: None Document Type: Article

Times cited : (29)

References (35)

1
- 0005941384
- short course pres. mat., June
- (2000) IEEE 2000 Symp. on VLSI Tech.
- Niwa, M.¹

2
- 0006012346
- North Carolina State Univ., presentation material on replacement gate process, June
- (2000) I-Sematech gate stack working group meeting
- Osburn, C.¹

3
- 4243355031
- short course present. material, Dec.
- (1999) IEEE IEDM 1999 on sub-100 nm CMOS
- Phillip Wong, H.S.¹

4
- 0004025987
- (2001) 2001 ITRS Roadmap

5
- 0001814217
- Sec. 18.1, June
- (2000) VLSI Symposium 2000 , pp. 174
- Ghani, T.¹

6
- 0033711844
- Jan.-Feb.
- (2000) Jour. of Vac. Sci. and Tech. , vol.18 , pp. 338
- Osburn, C.¹

7
- 4243456302
- IEEE, Sec. 29.2, Dec.
- (2001) IEDM-2001 , pp. 625
- Narasimha¹

8
- 0005939037
- Austin, Texas, Oct. 18
- (2001) USJ presentation material at the 4th National Implant Users Group Meeting
- Borland, J.¹

9
- 0005978971
- Oct.
- (2001) IEEE SOI workshop presentation material
- Sadana, D.¹

10
- 0006016219
- private customer communication on 65 nm and 90 nm targets
- Borland, J.¹

11
- 0006008978
- May
- (1999) ECS PV99-10, ECS Conf. , pp. 105
- Shishiguchi, S.¹

12
- 0006013318
- NCSU private communications
- Osburn, C.¹

13
- 0004011598
- pres. material, March
- (2000) I-SEMATECH source drain meeting
- Murto, B.¹

14
- 0004013760
- April
- (2001) Semiconductor International , pp. 70
- Borland, J.¹

15
- 4243353585
- IEEE, Sec. 31.3, Dec.
- (2000) IEDM 2000 , pp. 723
- Kim, S.¹

16
- 85009917913
- Spring, Materials Research Society, April
- (2000) MRS Meeting , vol.610
- Gossmann, H.¹

17
- 0005966557
- June
- (2000) Solid State Technology , pp. 50
- Taur, Y.¹ Gossmann Quote, H.²

18
- 0004156731
- Alpbach, Austria, Sept.
- (2000) IIT-2000 , pp. 25
- Bourdelle, K.¹

19
- 0003512202
- Nov. 8
- (2001) I-SEMATECH source drain engineering working group meeting
- Jain, A.¹

20
- 84864682372
- May
- (1999) Electrochem. Soc. Spring Meet. , vol.PV 99-10 , pp. 151
- Downey, D.¹

21
- 0006019805
- Sec. 2-3, Chiba, Japan, Dec.
- (2000) Extended abstract of the International Workshop on Junction Technology , pp. 29
- Matsuda¹

22
- 0004156730
- Alpbach, Austria, Sept.
- (2000) IIT-2000 , pp. 300
- Jacobson, D.¹

23
- 0003512204
- presentation material, Nov. 8
- (2001) I-SEMATECH source drain engineering working group meeting
- Gelpy, J.¹

24
- 0005974159
- April
- (2000) Joint VSEA/Verdant patent filing on submelt laser annealing
- Felch, S.¹

25
- 0002806198
- Sec. A-5-3, Sept.
- (2001) 2001 SSDM Conf. , pp. 182
- Ito, T.¹

26
- 0005973889
- pres. mat., Laser melt annealing, April
- (2001) Spring MRS 2001
- Talwar, S.¹

27
- 4244176195
- MRS, April
- (2001) Spring Meeting , vol.669
- Takamura, Y.¹

28
- 0004217022
- Austin, TX, June
- (1996) IIT-96 , pp. 607
- Osburn, C.¹

29
- 0005937461
- private communications
- Jacobson, D.¹

30
- 0004048315
- Kyoto, Japan, June
- (1998) IIT-98 , pp. 1211
- Borland, J.¹ Galewsld, C.²

31
- 0005973732
- Sec. 4A-1, June
- (2001) IEEE 2001 Symp. on VLSI Tech. , pp. 33
- Ponmanev, Y.¹

32
- 0005941385
- Sec. 2-1, June
- (1999) IEEE 1999 Symp. on VLSI Technology
- Tsuji, K.¹

33
- 0000291157
- ext. abs., Sec. A-7-4, Aug.
- (2000) 2000 SSDM Conf. , pp. 406
- Kanemoto, K.¹

34
- 0005972899
- New SPE patent filing, Nov. 2001
- Borland¹

35
- 0004156729
- Alpbach, Austria, Sept.
- (2000) IIT-2000 , pp. 54
- Al-Bayati, A.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.