Quantum confinement effect in SiO2 films containing Ge microcrystallites

Journal of Materials Science

Volumn 37, Issue 11, 2002, Pages 2259-2261

  Tang, N Y ^a   Wu, X M ^a   Zhuge, L J ^a   Ye, C N ^a   Yao, W G ^a   Chen, J ^b   Dong, Y M ^b   Yu, Y H ^b  

^a SOOCHOW UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; GERMANIUM; LIGHT ABSORPTION; MAGNETRON SPUTTERING; NONLINEAR OPTICS; PHOTONS; QUANTUM THEORY; SILICA;

MICROCRYSTALLITES;

THIN FILMS;

EID: 0036602954     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1015365232293     Document Type: Article

References (10)