Mechanical characterisation of γ-TiAl thin films obtained by two different sputtering routes

Materials Science and Engineering: A

Volumn 329-331, Issue , 2002, Pages 147-152

  Vieira, M T ^a   Trindade, B ^a   Ramos, A S ^a   Fernandes, J V ^b   Vieira, M F ^c  

^a UNIVERSITY OF COIMBRA   (Portugal)

^b UNIVERSITY OF COIMBRA   (Portugal)

^c UNIVERSITY OF PORTO   (Portugal)

Author keywords

Mechanical properties; Residual stress; Titanium aluminide thin films

Indexed keywords

AGING OF MATERIALS; ANNEALING; COMPRESSIVE STRESS; DUCTILITY; HARDNESS; INTERMETALLICS; MAGNETRON SPUTTERING; RESIDUAL STRESSES; SPUTTER DEPOSITION; TENSILE STRESS; THIN FILMS;

INTERMETALLIC FILMS;

TITANIUM ALLOYS;

CORROSION RESISTANCE; FILM; MECHANICAL PROPERTY; MICROSTRUCTURE; SPUTTERING; TITANIUM ALLOY;

EID: 0036601461     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5093(01)01550-7     Document Type: Article

References (13)

1. Three-dimensional numerical simulation of tensile tests in coatings