Fabrication of Ta2O5 piezoelectric thin film by the rapid thermal annealing method and measurement of piezoelectricity

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 5 B, 2002, Pages 3285-3289

  Nakagawa, Yasuhiko ^a   Igarashi, Tomomi ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

Linear rapid thermal annealing method; Single crystal; Ta2O5; Thin film

Indexed keywords

AMORPHOUS MATERIALS; PIEZOELECTRIC MATERIALS; PIEZOELECTRICITY; RAPID THERMAL ANNEALING; SINGLE CRYSTALS; SPUTTERING; TANTALUM COMPOUNDS;

LINEAR RAPID THERMAL ANNEALING METHOD; PIEZOELECTRIC THIN FILM; RADIO FREQUENCY SPUTTERING METHOD; SURFACE ACOUSTIC WAVE COMMUNICATION ELEMENT;

THIN FILMS;

EID: 0036578473     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.3285     Document Type: Article

References (5)