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Journal of Materials Science: Materials in Electronics

Volumn 13, Issue 5, 2002, Pages 303-308

Evolution of microstructure during annealing of low-dose SIMOX wafers implanted at 65 keV

(4) Johnson, B a Jeoung, Jun Sik a Anderson, P a Seraphin, Supapan a

a University of Arizona (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DEFECTS; ION IMPLANTATION; MICROSTRUCTURE; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON ON INSULATOR TECHNOLOGY; STACKING FAULTS; TRANSMISSION ELECTRON MICROSCOPY;

BURIED OXIDE (BOX) LAYERS;

SILICON WAFERS;

EID: 0036575669 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/A:1015528226182 Document Type: Article

Times cited : (4)

References (20)

1
- 4243774746
- (1993) IEDM Tech. Dig. , pp. 475
- Iwamatsu, T.¹ Yamaguchi, Y.² Inoue, Y.³ Nishimura, T.⁴ Tsubouchi, N.⁵

2
- 4244055441
- (1993) IEDM Tech. Dig. , pp. 449
- Huang, W.¹ Klein, K.² Grimaldi, M.³ Racanelli, M.⁴ Ramaswami, S.⁵ Tsao, J.⁶ Foerstner, J.⁷ Hwang, B.⁸

3
- 0027878001
- (1993) IEDM Tech. Dig. , pp. 75
- Dekker, R.¹ Einden, W.² Maas, H.³

4
- 4243854044
- (1993) IEDM Tech. Dig. , pp. 739
- Wei, H.¹ Chung, J.²

5
- 0001053005
- (1995) Nucl. Instrum. Methods Phys. Res. B , vol.96 , pp. 420
- Auberton-Herve, A.¹ Wittkower, A.² Aspar, B.³

6
- 0003783816
- Kluwer Academic Publishers, Norwell
- (1991) Silicon-on-Insulator Technology: Materials to VLSI , pp. 38
- Colinge, J.P.¹

7
- 4243635915
- (1993) Nucl. Instrum. Methods Phys. Res. B , vol.7 , pp. 170
- Nejim, A.¹ Li, Y.² Marsh, C.D.³ Hemment, P.L.F.⁴ Chater, R.J.⁵ Kilner, J.A.⁶ Giles, L.F.⁷ Booker, G.R.⁸

8
- 0027855168
- Palm Springs, October 1993 (Piscataway, NJ)
- (1993) Proceedings of IEEE International SOI Conference , pp. 88
- Masui, S.¹ Tachimori, M.²

9
- 0031102262
- (1997) IEICE Trans. Electron. , vol.E80-C , Issue.3 , pp. 364
- Nakashima, S.¹

10
- 0029732735
- (1996) J. Electrochem. Soc. , vol.145 , Issue.1 , pp. 244
- Nakashima, S.¹ Katayama, T.² Miyamura, Y.³ Matsuzaki, A.⁴ Kataoka, M.⁵ Ebi, D.⁶ Imai, M.⁷ Izumi, K.⁸ Ohwada, N.⁹

11
- 0026748028
- (1992) Mater. Sci. Eng. B , vol.12 , pp. 209
- Tsoukalas, D.¹ Tsamis, C.² Guillemot, N.³ Stoemenos, J.⁴ Margail, J.⁵

12
- 0000871757
- (1991) Nucl. Instrum. Methods Phys. Res. B , vol.55 , pp. 555
- Robinson, A.K.¹ Marsh, C.D.² Bussmann, U.³ Kilner, J.A.⁴ Li, Y.⁵ Vanhellemont, J.⁶ Reeson, K.J.⁷ Hemment, P.L.F.⁸ Booker, G.R.⁹

13
- 0001518321
- (1992) Mater. Res. Soc. Symp. Proc. , vol.235 , pp. 109
- Namavar, E.¹ Cortesi, E.² Buchanan, B.³ Manke, J.M.⁴ Kalkhoran, N.M.⁵

14
- 0009518145
- (1999) Proc. Electron Micros. Soc. Am. , vol.5 , pp. 744
- Wilson, T.¹ Jiao, J.² Seraphin, S.³ Johnson, B.⁴ Anc, M.⁵ Cordts B.F. III⁶

15
- 0033890415
- (2000) Mater. Sci. Eng. B , vol.72 , pp. 150
- Jiao, J.¹ Johnson, B.² Seraphin, S.³ Anc, M.J.⁴ Cordts B.F. III⁵

16
- 0009552014
- (1999) Proc. Electron Micros. Soc. Am. , vol.5 , pp. 746
- Johnson, E.¹ Jiao, J.² Seraphin, S.³ Tan, Y.⁴ Wilson, T.⁵ Anc, M.⁶ Cordts B.F. III⁷

17
- 0009546450
- (1987) Appl. Phys. Lett. , vol.50 , pp. 152
- Chang, P.-H.¹ Mao, B.-Y.²

18
- 0009491414
- (2000) Proc. Electron Micros. Soc. Am. , vol.6 , pp. 1086
- Tan, Y.¹ Johnson, B.² Seraphin, S.³ Anc, M.J.⁴

19
- 0001539711
- (1998) J. Electrochem. Soc. , vol.145 , Issue.5 , pp. 1755
- Ogura, A.¹

20
- 0004131297
- John Wiley & Sons
- (1997) Physical Ceramics , pp. 397
- Chiang, Y.-M.¹ Birnie D. III² Kingery, D.³

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