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Volumn 410, Issue 1-2, 2002, Pages 94-100

High concentration erbium doping of silicon-rich SiO2 thin films on silicon

Author keywords

Ion implantation; Luminescence; Metal vapor vacuum arc ion source; Silicon oxide; Surface structure

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; DOPING (ADDITIVES); ERBIUM; ION IMPLANTATION; MOLECULAR BEAM EPITAXY; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; PRECIPITATION (CHEMICAL); RAPID THERMAL ANNEALING; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEGREGATION (METALLOGRAPHY); SILICA; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0036574766     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00290-0     Document Type: Article
Times cited : (5)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.