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Volumn 410, Issue 1-2, 2002, Pages 94-100
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High concentration erbium doping of silicon-rich SiO2 thin films on silicon
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Author keywords
Ion implantation; Luminescence; Metal vapor vacuum arc ion source; Silicon oxide; Surface structure
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CRYSTALLIZATION;
DOPING (ADDITIVES);
ERBIUM;
ION IMPLANTATION;
MOLECULAR BEAM EPITAXY;
NANOSTRUCTURED MATERIALS;
PHOTOLUMINESCENCE;
PRECIPITATION (CHEMICAL);
RAPID THERMAL ANNEALING;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SEGREGATION (METALLOGRAPHY);
SILICA;
SILICON;
TRANSMISSION ELECTRON MICROSCOPY;
HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
THIN FILMS;
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EID: 0036574766
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(02)00290-0 Document Type: Article |
Times cited : (5)
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References (14)
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