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Volumn 81, Issue 5, 2002, Pages 36-41
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Thin films of advanced materials via CCVD
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIZATION;
CHEMICAL VAPOR DEPOSITION;
COATINGS;
COMBUSTION;
ELECTROOPTICAL MATERIALS;
ION IMPLANTATION;
PYROLYSIS;
STOICHIOMETRY;
SUPERCONDUCTING MATERIALS;
SYNTHESIS (CHEMICAL);
ADVANCED ENERGY APPLICATIONS;
COMBUSTION CHEMICAL VAPOR DEPOSITION;
NONVACUUM TECHNIQUES;
SPRAY PYROLYSIS;
THERMAL FORMING;
THIN FILMS;
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EID: 0036574607
PISSN: 00027812
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
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Times cited : (4)
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References (1)
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