Effect of high-energy Si+ ion irradiation on the crystallization behavior of amorphous strontium titanate films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 191, Issue 1-4, 2002, Pages 226-229

  Nakao, Setsuo ^a   Wang, Zhongchun ^b   Jin, Ping ^a   Miyagawa, Yoshiko ^a   Miyagawa, Soji ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Crystallization of amorphous film; Ion irradiation; Post annealing; SrTiO3 crystals

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTALLIZATION; ION BOMBARDMENT; MAGNETRON SPUTTERING; POSITIVE IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; STRONTIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ION IRRADIATION;

RADIATION EFFECTS;

EID: 0036574105     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00564-5     Document Type: Article

References (7)

1. The Stopping and Range of Ions in Solids