Heavy ion (Xe and I) irradiation effects on photoresist films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 191, Issue 1-4, 2002, Pages 733-738

  Garcia, Irene T S ^a   Zawislak, F C ^b   Balzaretti, Naira M ^b   Nastasi, M ^c  

^a Mestrado em Avaliacao de Impactos Ambientais em Mineracao Victor Barreto   (Brazil)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^c LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

Carbonization; Hardness; Ion irradiation; Photoresist

Indexed keywords

AMORPHOUS MATERIALS; CARBONIZATION; CHEMICAL MODIFICATION; COMPOSITION; ELASTIC MODULI; HARDNESS; HEAVY IONS; OPTICAL FILMS; PHOTORESISTS; RAMAN SCATTERING; TRIBOLOGY;

PHOTORESIST FILMS;

ION BOMBARDMENT;

EID: 0036573850     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)00643-2     Document Type: Article

References (10)