Far-infrared absorption due to thermally activated relaxation in vitreous silica

Physica B: Condensed Matter

Volumn 316-317, Issue , 2002, Pages 545-548

  Ozaki, T ^a   Iriura, H ^a   Matsumoto, S ^a   Kosugi, T ^b  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

^b TEIKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Boson peak; Dielectric dispersion; Infrared absorption; Vitreous silica

Indexed keywords

ACTIVATION ENERGY; DIELECTRIC MATERIALS; INFRARED RADIATION; NATURAL FREQUENCIES; PERMITTIVITY;

FAR-INFRARED ABSORPTION;

SILICA;

EID: 0036566785     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(02)00567-7     Document Type: Conference Paper

References (5)