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Volumn 5, Issue 2-3, 2002, Pages 105-114
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Influence of growth parameters on properties of electroceramic thin films grown via MO-CVD
e
ENEA CR Portici
(Italy)
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Author keywords
High k; MO CVD; Thin films; Zirconium titanate
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Indexed keywords
CRYSTALLOGRAPHY;
DIELECTRIC MATERIALS;
GROWTH (MATERIALS);
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MICROSTRUCTURE;
MORPHOLOGY;
REACTION KINETICS;
SCANNING ELECTRON MICROSCOPY;
ZIRCONIUM COMPOUNDS;
ELECTROCERAMICS;
THIN FILMS;
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EID: 0036557723
PISSN: 13698001
EISSN: None
Source Type: Journal
DOI: 10.1016/S1369-8001(02)00090-2 Document Type: Conference Paper |
Times cited : (3)
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References (17)
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