Apparatus to measure wafer curvature for multilayer systems in a vacuum furnace

Review of Scientific Instruments

Volumn 73, Issue 4, 2002, Pages 1821-

  Mann, A B ^a,b   Tapson, J ^c   Van Heerden, D ^a   Lewis, A C ^a   Josell, D ^d   Weihs, T P ^a  

^a Johns Hopkins University   (United States)

^b UNIVERSITY OF MANCHESTER   (United Kingdom)

^c UNIVERSITY OF CAPE TOWN   (South Africa)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036541278     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1455132     Document Type: Article

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