Control of plasma parameters and wall sheath voltage in radio frequency magnetron discharge by grid bias

Journal of Applied Physics

Volumn 91, Issue 7, 2002, Pages 4026-4032

  Sirghi, L ^a   Hatanaka, Y ^a   Popa, G ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE CHAMBER; DOUBLE PROBE; FILM DEPOSITION; MESH GRIDS; NEGATIVE BIAS; PARTICLE TRANSPORT; PLASMA ELECTRONS; PLASMA PARAMETER; PLASMA POTENTIAL; RADIO FREQUENCY MAGNETRON DISCHARGES; SHEATH VOLTAGE; TIO;

BIAS VOLTAGE; CARRIER CONCENTRATION; DEPOSITION; DIFFUSION; ELECTRON DENSITY MEASUREMENT; ELECTRON TEMPERATURE; PLASMA DEPOSITION; PLASMA DEVICES; PLASMAS; RADIO WAVES;

ELECTRIC DISCHARGES;

EID: 0036537111     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1454192     Document Type: Article

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