Comparison of elemental quantity by PIXE and ICP-MS and/or ICP-AES for NIST standards

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 189, Issue 1-4, 2002, Pages 86-93

  Saitoh, K ^a   Sera, K ^b   Gotoh, T ^c   Nakamura, M ^c  

^a Environmental Research and Information Center of Akita Prefecture   (Japan)

^b IWATE MEDICAL UNIVERSITY   (Japan)

^c Measurement and Analysis Division   (Japan)

Author keywords

ICP AES; ICP MS; Major to ultratrace elements; Multi element analysis; NIST sample; PIXE

Indexed keywords

ATOMIC SPECTROSCOPY; ELECTROMAGNETIC WAVE EMISSION; EMISSION SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; PARTICLES (PARTICULATE MATTER); TRACE ELEMENTS;

PARTICLE INDUCED X-RAY EMISSION (PIXE);

HIGH ENERGY PHYSICS;

EID: 0036534716     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)01012-6     Document Type: Conference Paper

References (4)